Archive for the ‘Yaw and Pitch’ Category

Motion Control – High Precision XYR Alignment Stage Has Better Than +/- 3 Micron Accuracy!

Motion Control – Alignment Stage! Van Nuys, CA – — Motion Control -Optimal Engineering Systems, Inc. (OES) has introduced the XYR-300-400 Alignment Stage offering +/- 3 micron accuracy for industrial, medical, semiconductor, production, research, and laboratory applications.  The XYR-300-400 Alignment Stage features +/- 15 mm of travel in the X and Y axes and +/- […]

Motion Control – High Precision Built-to-Order XZR Positioning Stages Available from OES!

Motion Control – Precision Positioning Stages!     Van Nuys, CA —– Motion Control – Build-to-Order High Precision XZR Positioning Stages (X-axis, Z-axis, and Rotary- axis) are the newest addition to the OES (Optimal Engineering Systems, Inc.) family of motion control stages.  When specifying an XZR stage a user can select from a combination of […]

Motion Control – Build-to-Order High Precision XZG Positioning Stages (X-axis, Z-axis, and Goniometer) from OES!

Motion Control – X-axis, Z-axis, plus Goniometer from OES! Van Nuys, CA – — Motion Control – An extensive series of XZG Positioning Stages (X-axis, Z-axis, and Goniometer) is the newest addition to the OES (Optimal Engineering Systems, Inc.) family of high precision motion control stages. Built to order, a user can select from any […]

Motion Control – Dual Axis Yaw-and-Pitch Stages Feature Full Range of Motion of Each Axis Under a Single Fixed Point in Space!

Motion Control – Yaw Pitch Stages       Van Nuys, CA – — Motion Control – A new, series of Dual-axis Yaw-and-Pitch Stages have been introduced by OES (Optimal Engineering Systems, Inc.). This new series of high precision Yaw-and-Pitch stages are ideal for precise measurements of compound curves and angles of an object during […]

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